Reactive ion etching of fluorine containing photoresist [6153-111]

Reactive ion etching of fluorine containing photoresist [6153-111]

著者名:

Patel, K. S. ( IBM Microelectronics Division (USA) )
Pham V ( IBM Microelectronics Division (USA) )
Li W ( IBM Microelectronics Division (USA) )
Khojasteh M ( IBM Microelectronics Division (USA) )
Varanasi, P. R ( IBM Microelectronics Division (USA) )

掲載資料名:

Advances in Resist Technology and Processing XXIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6153

発行年:

2006

パート:

1

開始ページ:

61530Q

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461964 [0819461962]

言語:

英語

請求記号:

P63600/6153

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016185
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Technology and Processing
回次:	2006 : 23th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.20-2006.02.22

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