Negative-tone polyphenol resist based on chemically amplified polarity change reaction with sub-50-nm resolution capability [6153-16]
- 著者名:
Kojima, K ( Hitachi, Ltd (Japan) ) Hattori, T ( Hitachi, Ltd (Japan) ) Fukuda, H ( Hitachi, Ltd (Japan) ) Hirayama, T ( Tokyo Ohka Kogyo Co Ltd (Japan) ) Shiono D ( Tokyo Ohka Kogyo Co Ltd (Japan) ) Hada, H ( Tokyo Ohka Kogyo Co Ltd (Japan) ) Onodera, J ( Tokyo Ohka Kogyo Co Ltd (Japan) ) - 掲載資料名:
- Advances in Resist Technology and Processing XXIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6153
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 61530G
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461964 [0819461962]
- 言語:
- 英語
- 請求記号:
- P63600/6153
- 資料種別:
- 国際会議録
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8
国際会議録
Resist composition effects on ultimate resolution of negative-tone chemically amplified resists
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
国際会議録
Photoacid generator study for chemically amplified negative resists for high-resolution lithography
SPIE-The International Society for Optical Engineering |