Top coat or no top coat immersion lighography?

著者名:

Stepanenko, N ( IMEC (Belgium) and infineon Technologies SC300 GmbH & Co (Germany) )

Kim, H W ( IMEC (Belgium) and Samsung Electronics Co Ltd (South Korea) )

Kishimura, S ( IMEC (Belgium) and Matsushita Electric Industrial Co Ltd (Japan) )

Van Den Heuvel, D ( IMEC (Belgium) )

Vandenbroeck, N ( IMEC (Belgium) )

Kocsis, M ( IMEC (Belgium) and Intel Corp (USA) )

Foubert, P ( IMEC (Belgium) )

Maenhoudt, M ( IMEC (Belgium) )

Ercken, M ( IMEC (Belgium) )

Van Roey, F ( IMEC (Belgium) )

Gronheid, R ( IMEC (Belgium) )

Pollentier, I ( IMEC (Belgium) )

Vangoidsenhoven, D ( IMEC (Belgium) )

Delvaux, C ( IMEC (Belgium) )

Baerts, C ( IMEC (Belgium) )

O’Brien, S ( Texas Instruments (USA) )

Fyen, W ( IMEC (Belgium) )

Wells, G ( IMEC (Belgium) and Texas Instruments (USA) )

さらに 13 件

掲載資料名:

Advances in Resist Technology and Processing XXIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6153

発行年:

2006

パート:

1

開始ページ:

615304

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461964 [0819461962]

言語:

英語

請求記号:

P63600/6153

資料種別:

国際会議録