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65-nm photolithography process window qualification study with advanced e-beam metrology and inspection systems [6152-188]

著者名:
  • Hsu, R. H ( United Microelectronics Corp. (Taiwan) )
  • Lin, B. S. M ( United Microelectronics Corp. (Taiwan) )
  • Wu, W. Y ( Hermes Systems (Taiwan) )
  • Xiao, H ( Hermes Microvision )
  • Jau, J ( Hermes Microvision, Inc. USA (USA) )
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6152
発行年:
2006
パート:
2
開始ページ:
61524K
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
言語:
英語
請求記号:
P63600/6152
資料種別:
国際会議録

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