Error factor in bottom CD measurement for conta.ct hole using CD-SEM [6152-185]
- 著者名:
- Abe, H. ( Toshiba Corp. (Japan) )
- Yamazaki, Y. ( Toshiba Corp. (Japan) )
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6152
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 61524H
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- 言語:
- 英語
- 請求記号:
- P63600/6152
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
国際会議録
Evaluation of OPC quality using automated edge placement error measurement with CD-SEM [6152-51]
SPIE - The International Society of Optical Engineering |
9
国際会議録
Influence of electron incident angle distribution on CD-SEM Iinewidth measurements [6152-160]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
国際会議録
Development of the automatic recipe generation system for CD-SEM using design data [6152-191]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |