Bias-free measurement of LER/LWR with low damage by CD-SEM [6152-89]
- 著者名:
- Yamaguchi, A. ( Hitachi Ltd. (Japan) )
- Steffen, R. ( Hitachi High-Technologies Corp. (Japan) )
- Kawada, H. ( Hitachi High-Technologies Corp. (Japan) )
- Iizumi, T. ( Hitachi High-Technologies Corp. (Japan) )
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6152
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 61522D
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- 言語:
- 英語
- 請求記号:
- P63600/6152
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
国際会議録
Influence of electron incident angle distribution on CD-SEM Iinewidth measurements [6152-160]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |