Blank Cover Image

Improvement of alignment and overlay accuracy on amorphous carbon layers [6152-73]

著者名:
Hwang, Y. S. ( Hynix Semiconductor Inc. (South Korea) )
Kang, E. ( Hynix Semiconductor Inc. (South Korea) )
Lee, K. ( Hynix Semiconductor Inc. (South Korea) )
Ban, K. D ( Hynix Semiconductor Inc. (South Korea) )
Bok, C. K. ( Hynix Semiconductor Inc. (South Korea) )
Lim, C. M. ( Hynix Semiconductor Inc. (South Korea) )
Kim, H. S ( Hynix Semiconductor Inc. (South Korea) )
Moon, S. C. ( Hynix Semiconductor Inc. (South Korea) )
さらに 3 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6152
発行年:
2006
パート:
1
開始ページ:
615222
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
言語:
英語
請求記号:
P63600/6152
資料種別:
国際会議録

類似資料:

1 国際会議録 Alignment system and process optimization for improvement of double patterning overlay

W. Ma, J. Kang, C. Lim, H. Kim, S. Moon

Society of Photo-optical Instrumentation Engineers
7 国際会議録 Effects of illumination wavelength on the accuracy of optical overlay metrology

Han,J.-S., Kim,H., Nam,J.-L., Han,M.-S., Lim,S.-K., Yanowitz,S.D., Smith,N.P., Smout,A.M.C.

SPIE-The International Society for Optical Engineering
2 国際会議録 Application of scatterometry to measure organic material profile [6152-110]

Koo, S., Ban, K., Lim. C., Bok, C., Moon, S. C., Kim. J.

SPIE - The International Society of Optical Engineering
8 国際会議録 Effective alignment techniques and their implementation to enhance total overlay accuracy on highly reflective films

Y.-H. Min, S.-C. Moon, H.-S. Kim, K.-H. Baik, S.-H. Choi

Society of Photo-optical Instrumentation Engineers
3 国際会議録 Study on the reduction of defects in immersion lithography

K. Ban, S. Park, C. Bok, H. Lim, J. Heo, H. Chun, J. Kang, S. Moon

SPIE - The International Society of Optical Engineering
9 国際会議録 Positive and negative tone double patterning lithography for 50nm flash memory [6154-37]

Lim, C. M., Kim, S. M., Hwang, Y. S., Choi, J. -S., Ban, K. -D., Cho, S. -Y., Jung, J. K., Knag, E. -K., Lim, H. -Y., …

SPIE - The International Society of Optical Engineering
4 国際会議録 Improvement of front-end process overlay in 60nm DRAM

Y. Hwang, W. Ma, E. Kang, C. Lim, S. Moon, S. An, K. Rhe

SPIE - The International Society of Optical Engineering
10 国際会議録 Polymer structure modifications for immersion leaching control

S. H. Lee, J. W. Kim, S. K. Oh, C. S. Park, J. Y. Lee, S. S. Kim, J. W. Lee, D. Kim, J. Kim, K. D. Ban, C. K. Bok, S. C. …

SPIE - The International Society of Optical Engineering
5 国際会議録 Hardware, materials, and parameters optimization for improvement of immersion overlay

W. Ma, Y. Hwang, E. Kang, S. Park, J. Kang, C. Lim, S. Moon

SPIE - The International Society of Optical Engineering
11 国際会議録 New shrinkage technology for nano-contact hole formation

Oh, S. K., Kim, J. Y., Jung, Y. H., Lee, J. W., Kim, D. B., Kim, J., Lee, G. S., Lee, S. K., Ban, K. D., Jung, J. C., …

SPIE - The International Society of Optical Engineering
6 国際会議録 Resolution enhanced top anti-reflective coating materials for ArF immersion lithography [6153-74]

Jung, J C, Lee, S K, Ban, K D, Bok C, Kim H S, Moon, S C, Kim, J

SPIE - The International Society of Optical Engineering
12 国際会議録 Modified polymer architecture for immersion lithography

S. S. Kim, J. W. Kim, J. Y. Lee, S. K. Oh, S. H. Lee, J. W. Lee, D. bae Kim, J. Kim, K. D. Ban, C. K. Bok, S. Moon

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12