Blank Cover Image

Evaluation of OPC quality using automated edge placement error measurement with CD-SEM [6152-51]

著者名:
  • Tabery, C. ( Advabced Micro Devices, Inc. (USA) )
  • Morokuma, H. ( Hitachi High-Technologites Corp. (Japan) )
  • Sugiyama, A. ( Hitachi High-Technologites Corp. (Japan) )
  • Page, L. ( Hitachi High Technologies America, Inc. (USA) )
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6152
発行年:
2006
パート:
1
開始ページ:
61521F
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
言語:
英語
請求記号:
P63600/6152
資料種別:
国際会議録

類似資料:

1 国際会議録 SEM image contouring for OPC model calibration and verification

C. Tabery, H. Morokuma, R. Matsuoka, L. Page, G. E. Bailey, I. Kusnadi, T. Do

SPIE - The International Society of Optical Engineering
7 国際会議録 MPPC technique for gate etch process monitoring using CD-SEM images and its validity verification

Tanaka, M., Shishido, C., Takagi, Y., Morokuma, H.

SPIE - The International Society of Optical Engineering
2 国際会議録 Automated CD-SEM recipe creation: a new paradigm in CD-SEM utilization [6152-47]

Bunday, B., Lipscomb, W., Allgair, J., Yang, K., Koshihara, S., Morokuma, H., Page, L., Danilevsky, A.

SPIE - The International Society of Optical Engineering
8 国際会議録 New approach to the focus exposure matrix(FEM)sample measurement using CD-SEM

Morokuma,H., Yamaguchi,S., Maeda,T., Iizumi,T., Ueda,K.

SPIE - The International Society for Optical Engineering
3 国際会議録 Major trends in extending CD-SEM utility

B. Bunday, J. Allgair, K. Yang, S. Koshihara, H. Morokuma, A. Danilevsky, C. Parker, L. Page

SPIE - The International Society of Optical Engineering
9 国際会議録 Automated flow for site definition and CD measurement with a SEM for use in mask production

Rotsch, C., Haffner, H., Ruebekohl, C., Buechner, B.

SPIE-The International Society for Optical Engineering
4 国際会議録 Development of the automatic recipe generation system for CD-SEM using design data [6152-191]

Matsuoka, R., Miyamoto, A., Nagatomo, W, Morokuma, H., Sutani, T

SPIE - The International Society of Optical Engineering
10 国際会議録 Automated OPC optimization using in-line CD-SEM

Su,B., Menaker,M., Haas,N., Subramanian,R., Singh,B.

SPIE-The International Society for Optical Engineering
5 国際会議録 Advanced DFM applications using design-based metrology on CD SEM [6152-194]

Lorusso, G. F., Capodieci, L., Stoler, D., Schulz, B., Roling, S., Schramm, J., Tabery, C., Shah, K., Singh, B., Abbott, …

SPIE - The International Society of Optical Engineering
11 国際会議録 CD-SEM calibration with TEM to reduce CD measurement error

Jeong, C.-Y., Lee, J., Park, K.-Y., Lee, W.G., Lee, D.-H.

SPIE-The International Society for Optical Engineering
6 国際会議録 Error factor in bottom CD measurement for conta.ct hole using CD-SEM [6152-185]

Abe, H., Yamazaki, Y.

SPIE - The International Society of Optical Engineering
12 国際会議録 Influence of electron incident angle distribution on CD-SEM Iinewidth measurements [6152-160]

Tanaka, M., Shishido, C., Kawada, H.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12