Automated CD-SEM recipe creation: a new paradigm in CD-SEM utilization [6152-47]
- 著者名:
Bunday, B. ( Intematinonal SEMATECH Manufacturing Initiative (USA) ) Lipscomb, W. ( Intematinonal SEMATECH Manufacturing Initiative (USA) ) Allgair, J. ( International SEMATECH Manufacturing Initiative (USA) and Freescale Semiconductor, Inc. (USA) ) Yang, K. ( Hitachi High-Technologies Corp. (Japan) ) Koshihara, S. ( Hitachi High-Technologies Corp. (Japan) ) Morokuma, H. ( Hitachi High-Technologies Corp. (Japan) ) Page, L. ( Hitachi High Technologies America, Inc. (USA) ) Danilevsky, A. ( Hitachi High Technologies America, Inc. (USA) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6152
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 61521B
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- 言語:
- 英語
- 請求記号:
- P63600/6152
- 資料種別:
- 国際会議録
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Evaluation of OPC quality using automated edge placement error measurement with CD-SEM [6152-51]
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Litho-metrology challenges for the 45-nmtechnology node and beyond (Invited Paper) [6152-12]
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Development of the automatic recipe generation system for CD-SEM using design data [6152-191]
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