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Macro analysis of line edge and line width roughness [6152-33]

著者名:
Shin, J. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoon, J. ( Samsung Electronics Co., Ltd. (South Korea) )
Jung, Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S. G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H. -K. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, J. -T. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 2 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6152
発行年:
2006
パート:
1
開始ページ:
61520X
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
言語:
英語
請求記号:
P63600/6152
資料種別:
国際会議録

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