Litho-metrology challenges for the 45-nmtechnology node and beyond (Invited Paper) [6152-12]

Litho-metrology challenges for the 45-nmtechnology node and beyond (Invited Paper) [6152-12]

著者名:

Allgair, J. A. ( International SEMATECH Manufacturing lnitictlve (USA) and Freescale Semiconductor (USA) )
Bunday, B. D. ( International SEMATECH Manufacturing Initiative (USA) )
Bishop, M. ( International SEMATECH Manufacturing Initiative (USA) )
Lipscomb, P. ( International SEMATECH Manufacturing Initiative (USA) )
Orji, N. G. ( National Institute of Standards and Technology (USA) )

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6152

発行年:

2006

パート:

1

開始ページ:

61520C

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461957 [0819461954]

言語:

英語

請求記号:

P63600/6152

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016184
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2006 : 20th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.20-2006.02.23

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