Energy spectra and charge states of debris emitted from laser-produced minimum mass tin plasmas [6151-135]

Energy spectra and charge states of debris emitted from laser-produced minimum mass tin plasmas [6151-135]

著者名:

Fujioka, S. ( Osaka Univ. (Japan) )

Nishimura, H. ( Osaka Univ. (Japan) )

Ando, T. ( Osaka Univ. (Japan) )

Ueda, N ( Osaka Univ. (Japan) )

Namba, S. ( Hiroshima Univ.(Japan) )

Aota, T. ( Osaka Univ. (Japan) )

Murakami, M. ( Osaka Univ. (Japan) )

Nishihara,K. ( Osaka Univ. (Japan) )

Kang,Y. G. ( Osaka Univ. (Japan) )

Sunahara, A. ( Institute for Laser Technology (Japan) )

Furukawa,H. ( Institute for Laser Technology (Japan) )

Hashimoto,K. ( Institute for Laser Technology (Japan) )

Yamaura, M. ( Institute for Laser Technology (Japan) )

Yasuda, Y. ( Osaka Univ. (Japan) )

Nagai, K. ( Osaka Univ. (Japan) )

Norimatsu, T. ( Osaka Univ. (Japan) )

Miyanaga, N. ( Osaka Univ. (Japan) )

Izawa, Y. ( Osaka Univ. (Japan) )

Mima, K. ( Osaka Univ. (Japan) )

さらに 14 件

掲載資料名:

Emerging Lithographic Technologies X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6151

発行年:

2006

パート:

2

開始ページ:

61513V

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

言語:

英語

請求記号:

P63600/6151

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016183
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2006 : 10th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.23

類似資料:

1 国際会議録 Properties of EUV emissions from laser-produced tin plasmas Shimada, Y., Nishimura, H., Hashimoto, K., Yamaura, M., Shigemori, K., Nakai, M., Fujioka, S., Uchida, S., Okuno, T., … SPIE - The International Society of Optical Engineering	7 国際会議録 Study on EUV emission properties of laser-produced plasma at ILE, Osaka Nakai, M., Nishimura, H., Shigemori, K., Miyanaga, N., Norimatsu, T., Nagai, K., Matsui, R., Hibino, T., Okuno, T., … SPIE - The International Society of Optical Engineering
2 国際会議録 Estimation of emission efficiency for laser-produced EUV plasmas Kawamura, T., Sunahara, A., Gamada, K., Fujima, K., Koike, F., Furukawa, H., Nishikawa, T., Sasaki, A., Kagawa, T., … SPIE - The International Society of Optical Engineering	8 国際会議録 Experimental study on basic properties of laser-produced EUV plasmas on GEKKO-XII laser facility Shigemori, K., Nakai, M., Shimada, Y., Yamaura, M., Hashimoto, K., Fujioka, S., Nishimura, H., Uchida, S., Sunahara, A., … SPIE - The International Society of Optical Engineering
3 国際会議録 Dependence of EUV emission properties on laser wavelength Yamaura, M., Uchida, S., Sunahara, A., Shimada, Y., Hashimoto, K., Yamanaka, C., Shigemori, K., Fujioka, S., Okuno, T., … SPIE - The International Society of Optical Engineering	9 国際会議録 Recent results on EUV mask blank multilayers and absorbers Furukawa, H., Kawamura, T., Nishikawa, T., Sasaki, A., Fujima, K., Fujioka, S., Nishimura, H., Nishihara, K., Miyanaga, … SPIE - The International Society of Optical Engineering
4 国際会議録 Progress in LPP EUV source development at Osaka University [6151-63] Miyanaga, N., Nishimura, H., Fujioka, S., Aota, T., Uchida, S., Yamaura, M., Shimada, K., Hashimoto, K., Nagai, K., … SPIE - The International Society of Optical Engineering	10 国際会議録 Experimental study on ablative stabilization of Rayleigh-Taylor instability of laser-irradiated targets Shigemori, K., Sakaiya, T., Otani, K., Fujioka, S., Nakai, M., Azechi, H., Shiraga, H., Tamari, Y., Okuno, K., Sunahara, … SPIE - The International Society of Optical Engineering
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