EUV source collector [6151-131]

EUV source collector [6151-131]

著者名:

Bowering N R ( Cymer Inc. (USA) )

Ershov A I ( Cymer Inc. (USA) )

Marx W F ( Cymer Inc. (USA) )

Khodykin O V ( Cymer Inc. (USA) )

Hansson B A M ( Cymer Inc. (USA) )

Vargas E ( Cymer Inc. (USA) )

Chavez L J A ( Cymer Inc. (USA) )

Fomenkov I V ( Cymer Inc. (USA) )

Myers D W ( Cymer Inc. (USA) )

Brandt D C ( Cymer Inc. (USA) )

さらに 5 件

掲載資料名:

Emerging Lithographic Technologies X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6151

発行年:

2006

パート:

2

開始ページ:

61513R

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

言語:

英語

請求記号:

P63600/6151

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016183
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2006 : 10th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.23

類似資料:

1 国際会議録 LPP EUV source developmentfor HVM [6151-26] Hansson, B. A. M., Fomenkov, I. V., Bowering, N. R., Ershov, A.. I., Partio, W. N, Myers, D. W., Khodykin,O.V., … SPIE - The International Society of Optical Engineering	7 国際会議録 EUV focus sensor: design and modeling Hoffman, J. R., Bykanov, A. N., Khodykin, O. V., Ershov, A. I., Bowering, N. R., Fomenkov, I. V., Partlo, W. N., Myers, … SPIE - The International Society of Optical Engineering
2 国際会議録 LPP EUV source development for HVM D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Bowering, A. N. Bykanov, G. O. Vaschenko, … SPIE - The International Society of Optical Engineering	8 国際会議録 Laser-produced plasma source system development D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers Society of Photo-optical Instrumentation Engineers
3 国際会議録 High-power low cost drive laser for LPP source [6151-137] Fomenkov, I V., Hanssaon, B. A. M., Boering, N. R., Ershov, A. I., Partlo, W. N., Fleurov, V. B., Khodykin, O. V., … SPIE - The International Society of Optical Engineering	9 国際会議録 Performance and scaling of a dense plasma focus light source for EUV lithography Fomenkov, I.V., Ness, R.M., Oliver, I.R., Melnychuk, S.T., Khodykin, O.V., Boewering, N.R., Rettig, C.L., Hoffman, J.R. SPIE - The International Society of Optical Engineering
4 国際会議録 Laser-produced plasma source system development I. V. Fomenkov, D. C. Brandt, A. N. Bykanov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Bowering, G. O. Vaschenko, … SPIE - The International Society of Optical Engineering	10 国際会議録 Performance and scaling of a dense plasma focus light source for EUV lithography Fomenkov, I.V., Ness, R.M., Oliver, I.R., Melnychuk, S.T., Khodykin, O.V., Boewering, N.R., Rettig, C.L., Hoffman, J.R. SPIE-The International Society for Optical Engineering
5 国際会議録 High-temperature LPP collector mirror [6151-152] Feigl, T., Yulin,S., Benoit, N., Kaiser,N., Bowering, N. R., Ershov,A.I., Khodykin,O. V., Viatella, J. W., … SPIE - The International Society of Optical Engineering	11 国際会議録 Optimization of a dense plasma focus device as a light source for EUV lithography Fomenkov, I.V., Partlo, W.N., Ness, R.M., Oliver, I.R., Melnychuk, S.T., Khodykin, O.V., Boewering, N.R. SPIE-The International Society for Optical Engineering
6 国際会議録 Zone-plate-array lithography (ZPAL): optical maskless lithography for cost-effective patterning Rettig, C. L., Khodykin, O. V., Hoffman, J. R., Marx, W. F., Bowering, N. R., Vargas, E., Ershov, A. I., Fomenkov, I. … SPIE - The International Society of Optical Engineering	12 国際会議録 EUV sources for the alpha-tools [6151-25] Pankert, J., Apetz, R., Bergmann, K., Damen, M., Derra, G., Franken, O., Jassen, M., Jonkers, J., Klein, J., Kraus, H., … SPIE - The International Society of Optical Engineering

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