Polarization dependence of multilayer reflectance in the EUV spectral range [6151-111]

Polarization dependence of multilayer reflectance in the EUV spectral range [6151-111]

著者名:

Scholze, F. ( Physikalisch-Technische Bundesanstalt (Germany) )

Laubis, C. ( Physikalisch-Technische Bundesanstalt (Germany) )

Buchholz, C. ( Physikalisch-Technische Bundesanstalt (Germany) )

Fischer, A. ( Physikalisch-Technische Bundesanstalt (Germany) )

Ploger, S ( Physikalisch-Technische Bundesanstalt (Germany) )

Scholz, F ( Physikalisch-Technische Bundesanstalt (Germany) )

Ulm, G ( Physikalisch-Technische Bundesanstalt (Germany) )

さらに 2 件

掲載資料名:

Emerging Lithographic Technologies X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6151

発行年:

2006

パート:

2

開始ページ:

615137

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

言語:

英語

請求記号:

P63600/6151

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016183
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2006 : 10th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.23

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2 国際会議録 Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB[6151-18] Laubis, C., Buchholz, C., Fischer, A., Ploger, S., Scholz, F., Wagner, H., Scholze, F., Ulm, G., Enkisch, H., Mullender, … SPIE - The International Society of Optical Engineering	8 国際会議録 Spectral responsivity of silicon photodiodes:high-accuracy measurement and improved self-calibration in the soft x-ray spectral range Scholze,F., Rabus,H., Ulm,G. SPIE-The International Society for Optical Engineering
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4 国際会議録 Metrology in the soft x-ray range: from EUV to the water window C. Laubis, F. Scholze, G. Ulm Society of Photo-optical Instrumentation Engineers	10 国際会議録 Multilayer optics with spectral purity layers for the EUV wavelength range [6151-155] Louis, E., Van de Kruijs, R. W. E, Yakshin, A. E., Van der Westen, S. A, Bijkerk, F., Van Herpen, M. M. J. W., Klunder, … SPIE - The International Society of Optical Engineering
5 国際会議録 Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM simulation F. Scholze, C. Laubis, G. Ulm, U. Dersch, J. Pomplun Society of Photo-optical Instrumentation Engineers	11 国際会議録 Finite element analysis of EUV lithography J. Pomplun, S. Burger, F. Schmidt, F. Scholze, C. Laubis, U. Dersch SPIE - The International Society of Optical Engineering
6 国際会議録 Multilayer reflectance during exposure to EUV radiation Oestreich,S., Klein,R., Scholze,F., Jonkers,J., Louis,E., Yakshin,A.E., Gorts,P.C., Ulm,G., Haidl,M., Bijkerk,F. SPIE-The International Society for Optical Engineering	12 国際会議録 Detector calibration at the radiometry laboratory of the Physikalisch-Technische Bundesanstalt in the VUV and soft x-ray spectral ranges using synchrotron … T. Lederer, H. Rabus, F. Scholze, R. Thornagel, G. Ulm Society of Photo-optical Instrumentation Engineers

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