The effects of wafer-scan induced image blur on CD control image slope and process window in maskless lithography [6151-86]

The effects of wafer-scan induced image blur on CD control image slope and process window in maskless lithography [6151-86]

著者名:

Chen Y. ( Micron Technology Inc. (USA) )
Shroff Y. ( Intel Corp. (USA) )

掲載資料名:

Emerging Lithographic Technologies X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6151

発行年:

2006

パート:

2

開始ページ:

61512D

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

言語:

英語

請求記号:

P63600/6151

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016183
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2006 : 10th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.23

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