EUV imaging with a 13 nm tabletop laser reachessub-38 nm spatial resolution [6151-33]

EUV imaging with a 13 nm tabletop laser reachessub-38 nm spatial resolution [6151-33]

著者名:

Vaschenko, G ( Colorado State Univ (USA) )

Brizuela, F ( Colorado State Univ (USA) )

Brewer, C ( Colorado State Univ (USA) )

Larotonda, M A ( Colorado State Univ (USA) )

Wang, Y ( Colorado State Univ (USA) )

Luther, B M ( Colorado State Univ (USA) )

Marconi, M C ( Colorado State Univ (USA) )

Rocca, J J ( Colorado State Univ (USA) )

Menoni, C S ( Colorado State Univ (USA) )

Chao, W ( Lawrence Berkeley National Lab, (USA) and Univ of California/Berkeley (USA) )

Anderson, E H ( Lawrence Berkeley National Lab, (USA) and Univ of California/Berkeley (USA) )

Liu, Y ( Lawrence Berkeley National Lab, (USA) and Univ of California/Berkeley (USA) )

Attwood, D T ( Lawrence Berkeley National Lab, (USA) and Univ of California/Berkeley (USA) )

さらに 8 件

掲載資料名:

Emerging Lithographic Technologies X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6151

発行年:

2006

パート:

1

開始ページ:

61510X

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

言語:

英語

請求記号:

P63600/6151

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016183
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2006 : 10th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.23

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