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Demonstration of phase-shift masks for extreme-ultraviolet lithography [6151-10]

著者名:
La Fontaine, B. ( Advanced Micro Devices (USA) )
Pawloski, A. R. ( Advanced Micro Devices (USA) )
Wood, O. ( Advanced Micro Devices (USA) )
Deng, Y. ( Advanced Micro Devices (USA) )
Levinson, H. J. ( Advanced Micro Devices (USA) )
Naulleau, P. ( Lawrence Berkeley National Lab. (USA) )
Denham, P. E. ( Lawrence Berkeley National Lab. (USA) )
Gullikson, E. ( Lawrence Berkeley National Lab. (USA) )
Hoef, B. ( Lawrence Berkeley National Lab. (USA) )
Holfeld, C. ( Advanced Mask Technology Ctr. (Germany) )
Chovino, C. ( Advanced Mask Technology Ctr. (Germany) )
Letzkus, F. ( Institute for Microelectronics (Germany) )
さらに 7 件
掲載資料名:
Emerging Lithographic Technologies X
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6151
発行年:
2006
パート:
1
開始ページ:
61510A
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461940 [0819461946]
言語:
英語
請求記号:
P63600/6151
資料種別:
国際会議録

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