In-line implant and RTP process monitoring using the carrier illumination technique for 65 nm and beyond [6104-35]

In-line implant and RTP process monitoring using the carrier illumination technique for 65 nm and beyond [6104-35]

著者名:

Li, C. I. ( United Microelectronics Corp. (Taiwan) )

Chuang, H. L. ( United Microelectronics Corp. (Taiwan) )

Chen, P. Y. ( United Microelectronics Corp. (Taiwan) )

Liu, C. H. ( United Microelectronics Corp. (Taiwan) )

Chien, C. C. ( United Microelectronics Corp. (Taiwan) )

Huang, K. T. ( United Microelectronics Corp. (Taiwan) )

Tzou, S. F. ( United Microelectronics Corp. (Taiwan) )

さらに 2 件

掲載資料名:

High-Power Diode Laser Technology and Applications IV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6104

発行年:

2006

開始ページ:

61040T

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461469 [0819461466]

言語:

英語

請求記号:

P63600/6104

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016138
シリーズID:	PA00000029
会議名:	SPIE LASE : High-power diode laser technology and applications
回次:	2006 : 4th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.01.23-2006.01.25

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