Silicon dry etching profile control by RIE at room temperature for MEMS applications [6037-88]

Silicon dry etching profile control by RIE at room temperature for MEMS applications [6037-88]

著者名:

Vrtacnik D.
Resnik D.
Aljancic U.
Mozek M.
Amon S. ( Univ. of Ljubljana (Slovenia) )

掲載資料名:

Device and process technologies for microelectronics, MEMS, and photonics IV : 12-14 December 2005, Brisbane, Australia

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6037

発行年:

2006

開始ページ:

603720

終了ページ:

603722

総ページ数:

3

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460684 [0819460680]

言語:

英語

請求記号:

P63600/6037

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016072
シリーズID:	PA00000029
会議名:	Smart Materials, Nano-, and Micro- Smart Systems : Device and process technologies for microelectronics, MEMS, and photonics
回次:	2005 : 4th
会議開催地:	Brisbane, Australia
会議開催年:	2005.12.12-2005.12.14

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