Photonic crystal fabrication on silicon-on-insulator (SOI) using 248nm and 193nm lithography (Invited Paper) [6017-13]
- 著者名:
Salib M. ( Intel Corp. (USA) ) Michaeli A. Lazar A. Bechor H. ( Intel Corp. (Israel) ) Settle M. Krauss Univ. of St. Andrews (United Kingdom) - 掲載資料名:
- Nanophotonics for communication : materials and devices II : 24 and 26 October, 2005, Boston, Massachusetts, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6017
- 発行年:
- 2005
- 開始ページ:
- 60170B
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460417 [0819460419]
- 言語:
- 英語
- 請求記号:
- P63600/6017
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
国際会議録
Trench pattern lithography for 0.13- and 0.10-μm logic devices at 248- and 193-nm wavelengths
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |