Advanced e-beam CAR resist evaluation for 65nm generation [5992-112]

Advanced e-beam CAR resist evaluation for 65nm generation [5992-112]

著者名:

Chan, G.

Kozuma, M. ( Toppan Chungwa Electronics Co., Ltd. (Taiwan) )

さらに 1 件

掲載資料名:

25th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5992

発行年:

2005

パート:

2

開始ページ:

59923B

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

言語:

英語

請求記号:

P63600/5992

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016029
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2005 : 25th
会議開催地:	Monterey, California, USA
会議開催年:	2005.10.04-2005.10.07

類似資料:

1 国際会議録 High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask making Huang,W.-S., Kwong,R.W., Moreau,W.M., Lang,R., Robinson,C.F., Medeiros,D.R., Petrillo,K.E., Aviram,A., Mahorowala,A.P., … SPIE-The International Society for Optical Engineering	7 国際会議録 High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making Huang,W.-S., Kwong,R.W., Moreau,W.M., Lang,R., Robinson,C.F., Medeiros,D.R., Petrillo,K.E., Aviram,A., Mahorowala,A.P., … SPIE-The International Society for Optical Engineering
2 国際会議録 65-nm photolithography process window qualification study with advanced e-beam metrology and inspection systems [6152-188] Hsu, R. H, Lin, B. S. M, Wu, W. Y, Xiao, H, Jau, J SPIE - The International Society of Optical Engineering	8 国際会議録 Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection Hsu, S., Chu, T. -B., Van Den Broeke, D., Chen, J. F., Hsu, M., Corcoran, N. P., Volk, W., Ruch, W. E., Sier, J. -P., … SPIE - The International Society of Optical Engineering
3 国際会議録 Advanced reticle inspection challenges and solutions for 65nm node [5992-12] Kim, W. D., Eickhoff, M. D., Kim, D., McCurley, S. SPIE - The International Society of Optical Engineering	9 国際会議録 Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication Magg,C., Lercel,M.J., Lawliss,M., Kwong,R.W., Huang,W.-S., Angelopoulos,M. SPIE-The International Society for Optical Engineering
4 国際会議録 Advanced photomask repair technology for 65 nm lithography (4) [5992-170] Itou, Y., Tanaka, Y., Suga, O., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Kozakai, T., Matsuda, O., … SPIE - The International Society of Optical Engineering	10 国際会議録 Evaluation and implementation of TeraScan reflected light die-to-database inspection mode for 65nm design node process [5992-07] Hsu, L. T. H., Ho, C. H., Lin, C. C., Hsu, V., Chen, E., Yu, P., Son, K. SPIE - The International Society of Optical Engineering
5 国際会議録 Sensitivity factors of CAR electron-beam resists Medeiros, D.R., Petrillo, K.E., Breyta, G., Huang, W.-S., Moreau, W.M. SPIE-The International Society for Optical Engineering	11 国際会議録 Mask-making study for the 65-nm node Chen, C.-J., Lee, H.-C., Lu, C.-L., Hsieh, R.-G., Chen, W.-C., Hsieh, H.-C., Lin, B.-J. SPIE - The International Society of Optical Engineering
6 国際会議録 Evaluation of a new-generation photomask develop system for CAR Cantrell, R., Tschinkl, M., Feicke, A., Porsche, W., Lee, G., Kotoda, T., Tichy, P., Fukai, T., Kamei, S., Asai, H. SPIE - The International Society of Optical Engineering	12 国際会議録 Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86] Kudo, T., Lin, G., Lee, D., Rahman, D., Timko, A., Mckenzie, D., Anyadiegwu, C., Chiu, S., Houlihan, F., Rentkiewicz, … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12