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Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations [5992-110]

著者名:
Chen, T.
Van Den Broeke, D.
Hsu, S.
Park, S.
Berger, G.
Coskun, T.
de Vocht, J.
Chen, F. ( ASML MaskTools, Inc. (USA) )
Socha, R. ( ASML TDC (USA) )
Park, J.
Gronlund, K. ( ASML MaskTools, Inc. (USA) )
さらに 6 件
掲載資料名:
25th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5992
発行年:
2005
パート:
2
開始ページ:
599239
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
言語:
英語
請求記号:
P63600/5992
資料種別:
国際会議録

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