Implementation of random contact hole design with CPL mask by using IML technology [5992-108]
- 著者名:
Hsu, M. Van Den Broeke, D. Hsu, S. Chen, J. F. Shi, X. Corcoran, N. Yu, L. ( ASML MaskTools, Inc. (USA) ) - 掲載資料名:
- 25th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5992
- 発行年:
- 2005
- パート:
- 2
- 開始ページ:
- 599237
- 終了ページ:
- 599237
- 総ページ数:
- 1
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- 言語:
- 英語
- 請求記号:
- P63600/5992
- 資料種別:
- 国際会議録
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Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]
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Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
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Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL
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