Study of effects of sidewall angle on process window using 193nm CPL masks in a 300mm wafer manufacturing environment [5992-92]
- 著者名:
- Cheng, Y. F.
- Chou, Y. L.
- Lin, C. L.
- Huang, P. ( United Microelectronics Corp. (Taiwan) )
- 掲載資料名:
- 25th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5992
- 発行年:
- 2005
- パート:
- 2
- 開始ページ:
- 59922R
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- 言語:
- 英語
- 請求記号:
- P63600/5992
- 資料種別:
- 国際会議録
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