Double exposure technique for 45nm node and beyond [5992-63]

Double exposure technique for 45nm node and beyond [5992-63]

著者名:

Hsu, S.
Park, J.
Van Den Broeke, D.
Chen, J. F. ( ASML MaskTools (USA) )

掲載資料名:

25th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5992

発行年:

2005

パート:

1

開始ページ:

59921Q

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

言語:

英語

請求記号:

P63600/5992

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016029
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2005 : 25th
会議開催地:	Monterey, California, USA
会議開催年:	2005.10.04-2005.10.07

類似資料:

1 国際会議録 Feasibility study of double exposure lithography for 65nm and 45nm node [5853-114] Hsu, S., Van Den Broeke, D., Chen, J. F., Park, J., Hsu, M. C. W. SPIE - The International Society of Optical Engineering	7 国際会議録 Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection Hsu, S., Chu, T. -B., Van Den Broeke, D., Chen, J. F., Hsu, M., Corcoran, N. P., Volk, W., Ruch, W. E., Sier, J. -P., … SPIE - The International Society of Optical Engineering
2 国際会議録 Dark field double dipole lithography (DDL) for 45 nm node and beyond [6283-103] Hsu, S., Burkhardt, M., Park, J., Van Den Broeke, D., Chen, F. J. SPIE - The International Society of Optical Engineering	8 国際会議録 A single-exposure approach for petterning 45 nm flash/DRAM contacthole mask [6283-117] Chen, T., Van Den Broeke, D., Tejnil, E., Hsu, S., Park, S., Berger, G., Coskun, T., De Vocht, J., Corcoran, N., Chen, … SPIE - The International Society of Optical Engineering
3 国際会議録 Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75] Park, J., Hsu, S., Van Den Broeke, D., Chen, J. F., Dusa, M., Socha, R., Finders, J., Vleeming, B., van Oosten, A., … SPIE - The International Society of Optical Engineering	9 国際会議録 Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50] Hsu, M., Van Den Broeke, D., Laidig, T., Wampler, K. E., Hollerbach, U., Socha, R., Chen, J. F., Hsu, S., Shi, X. SPIE - The International Society of Optical Engineering
4 国際会議録 Double dipole lithography for 65-nm node and beyond: a technology readiness review Hsu, S.D., Eurlings, M., Hendrickx, E., Van Den Broeke, D.J., Chiou, T.-B., Chen, J.F., Laidig, T.L., Shi, X., Finders, … SPIE - The International Society of Optical Engineering	10 国際会議録 Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations [5992-110] Chen, T., Van Den Broeke, D., Hsu, S., Park, S., Berger, G., Coskun, T., de Vocht, J., Chen, F., Socha, R., Park, J., … SPIE - The International Society of Optical Engineering
5 国際会議録 RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114] Hsu, M., Chen, F. J., Van Den Broeke, D., En Tszng, S., Shieh, J., Hsu, S., Shi, X. SPIE - The International Society of Optical Engineering	11 国際会議録 Contact and via hole mask design optimization for 65-nm technology node Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. … SPIE - The International Society of Optical Engineering
6 国際会議録 Manufacturing implementation of IML technology for 45nm node contact masks [6283-65] Van Den Broeke, D., Hsu, M., Chen, F. J., Hsu, S., Hollerbach, U., Laidig, Y. SPIE - The International Society of Optical Engineering	12 国際会議録 Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination [6154-60] Chen, T., Van Den Broeke D, Hsu, S, Park S, Berger G, Coskun T, De Vocht J, Corcoran N, Chen F, Van der Heijden, Finders … SPIE - The International Society of Optical Engineering

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