Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase-shift mask [5992-62] | 東京工業大学附属図書館文献データベース

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Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase-shift mask [5992-62]

著者名:

Chakravorty, K.

Chandramouli, M.

Padmanaban, R. ( Intel Corp (USA) )

さらに 8 件

掲載資料名:

25th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5992

発行年:

2005

パート:

1

開始ページ:

59921P

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

言語:

英語

請求記号:

P63600/5992

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016029
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2005 : 25th
会議開催地:	Monterey, California, USA
会議開催年:	2005.10.04-2005.10.07

類似資料:

1 国際会議録 Alt-phase shift mask technology for 65nm logic applications [6154-22] Chakravorty, K. K., Henrichs, S., Qiu, W., Chavez, J. L., Liu, Y.-P., Ghadiali, F., Yung, K., Wilcox, N., Silva, M., Ma, … SPIE - The International Society of Optical Engineering	7 国際会議録 Image imbalance compensation in alternating phase-shift masks towards the 45-nm node through-pitch imaging [5992-65] Van Look, L., Kasprowicz, B., Zibold, A., Degel, W., Vandenberghe, G. SPIE - The International Society of Optical Engineering
2 国際会議録 Second level exposure for phase shift mask applications using an SLM-based DUV mask writer [5853-134] Chandramouli, M., Olshausen, B., Korobko, Y., Henrichs, S., Qu, P., Ma, J., Auches, B., Cole, D., Ostrom, T., Beyerl, … SPIE - The International Society of Optical Engineering	8 国際会議録 Image performance and mask characterization of 157-nm alternating phase-shifting mask Chen, Y.-T., Meute, J., Dean, K.R., Stark, D.R., Schilz, C.M., Dettmann, W., Koehle, R., Schiessl, B., Degel, W. SPIE-The International Society for Optical Engineering
3 国際会議録 Design for manufacturing approach to second level alternating phase shift mask patterning S. Henrichs, M. Chandramouli, M. C. Tsai SPIE - The International Society of Optical Engineering	9 国際会議録 Evaluation of overlay accuracy of phase-shift image for 65-nm node masks Komagata, T., Kimura, N., Funaki, K., Nakagawa, Y., Gotoh, N. SPIE - The International Society of Optical Engineering
4 国際会議録 Technological challenges in implementation of alternating phase-shift mask Tsai,W., Qian,Q., Buckmann,K.M., Cheng,W.-H., He,L., Irvine,B., Kamna,M., Korobko,Y., Kovalchick,M., Labovitz,S.M., … SPIE-The International Society for Optical Engineering	10 国際会議録 Study of alternating phase-shift mask structure for 65-nm node devices Konishi, T., Komizo, T., Takahashi, H., Morita, M., Ohshima, T., Chiba, K., Kojima, Y., Sasaki, J., Tanaka, K., Otaki, … SPIE - The International Society of Optical Engineering
5 国際会議録 Alternating phase shift mask architecture scalability, implementations, and applications for 90-nm and 65-nm technology nodes and beyond Cheng, W.-H., Chakravorty, K.K., Farnsworth, J.N. SPIE-The International Society for Optical Engineering	11 国際会議録 Preliminary study of 65-nm-node alternating phase-shift mask fabrication Hosono, K., Ishikawa, N., Asai, S., Maruyama, H., Miyahara, Y., Sasaki, S., Yamashita, Y., Hotta, Y., Furukawa, T., … SPIE-The International Society for Optical Engineering
6 国際会議録 Production performance of a Sigma7300 DUV mask writer [5992-32] Olshausen, B., Chandramouli, M., Wall, D., Auches, B., Cole, D. SPIE - The International Society of Optical Engineering	12 国際会議録 Alternatives to alternating phase-shift masks for 65 nm Torres, J.A., Maurer, W. SPIE-The International Society for Optical Engineering

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