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Advanced mask cleaning techniques for sub-100-nm technology nodes [5992-53]

著者名:
Papanu, J. S.
Gouk, R.
Franklin, C.
Chen, H. -W.
Verhaverbeke, S.
Ko, A.
Child, K.
Boelen, P.
Shrauti, S.
Martinez, E.
Brown, B. J. ( Applied Materials Inc. (USA) )
さらに 6 件
掲載資料名:
25th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5992
発行年:
2005
パート:
1
開始ページ:
59921G
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819460141 [0819460141]
言語:
英語
請求記号:
P63600/5992
資料種別:
国際会議録

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