Through-process window resist modelling strategies for the 65 nm node [5992-46]
- 著者名:
Borjon, A. ( Philips Semiconductors (France), Freescale Semiconductor (France), LETI-CEA (France), STMicroelectronics (France), and LTM-CNRS (France) ) Belledent, J. ( Philips Semiconductors (France) ) Troullier, Y. ( LETI-CEA (France) ) Patterson, K. Lucas, K. ( Freescale Semiconducto (France) ) Couderc, C. ( Philips Semiconductors (France) ) Sundermann, F. Urbani, J. -C. Baron, S. ( STMicoelectronics (France) ) Rody, Y. ( Philips Semiconductors (France) ) Gardin, C. ( Freescale Semiconducto (France) ) Foussadier, F. ( STMicoelectronics (France) ) Schiavone, P. ( LTM-CNRS (France) ) - 掲載資料名:
- 25th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5992
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 599219
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- 言語:
- 英語
- 請求記号:
- P63600/5992
- 資料種別:
- 国際会議録
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