Reduction of MDP complexity through the application of OASIS based data flow [5992-39]

Reduction of MDP complexity through the application of OASIS based data flow [5992-39]

著者名:

Jang, S. -H.
Choi, J. -H.
Park, J. -S,
Choi, S. -W. ( Samsung Electronics Co. Ltd (South Korea) )

掲載資料名:

25th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5992

発行年:

2005

パート:

1

開始ページ:

599212

終了ページ:

599212

総ページ数:

1

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

言語:

英語

請求記号:

P63600/5992

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016029
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2005 : 25th
会議開催地:	Monterey, California, USA
会議開催年:	2005.10.04-2005.10.07

類似資料:

1 国際会議録 Reduction of MDP time through the improvement of verification method [6283-57] Noh, -H. Y., Jang, -H. S., Ki, -T. W., Choi, -H. J., Choi, -W. S., Han, -S. W. SPIE - The International Society of Optical Engineering	7 国際会議録 Acid-doped Polymide Electrolyte Membranes with Pendant Benzimidazole Groups for Fuel Cell Applications W. Jang, S. Choi, S. Lee, S. Park, J. Seo, Y. Shul, H. Han Electrochemical Society
2 国際会議録 Optimized distributed computing environment for mask data preparation [5992-41] Ahn, B. -S., Bang, J. -M., Ji, M. -K., Kang, S., Jang, S. -H., Choi, Y. -H., Ki, W. -T., Choi, S. -W., Han, W. -S. SPIE - The International Society of Optical Engineering	8 国際会議録 Implementation of reflected light die-to-die inspection and ReviewSmart to improve 65nm DRAM mask fabrication [5992-09] Kim, D. Y., Cho, W. I., Park, J. H., Chung, D. H., Cha, B. C., Choi, S. W., Han, W. S., Park, K. H., Kim, N. W., Hess, … SPIE - The International Society of Optical Engineering
3 国際会議録 A study of Cr to Mosi in situ dry etching process to reduce plasma induced defect [5992-25] Jang, I. -Y., Park, Y. -J., Kwon, H. -J., Moon, S. -Y., Choi, S. -W., Han, W. S. SPIE - The International Society of Optical Engineering	9 国際会議録 Fabrication and Characterization of Color Phosphors Prepared Electrophoretically for 4-Inch Full-Color FED Application Hong, J. P., Jang, J. E., Jin, Y. H., Kim, J. W., Choi, J. H., You, Y. C., Park, N. S., Kim, J. M. MRS - Materials Research Society
4 国際会議録 Load balancing using DP management server for commercial MDP software [6349-146] Kim, J.-W., Ki, W.-T., Jang, S.-H., Choi, J.-H., Choi, S.-W., Han, W.-S. SPIE - The International Society of Optical Engineering	10 国際会議録 Reticle haze measurement by spectroscopic elipsometry [5992-156] Kim, Y. -H., Kim, S. -J., Park, J. -B., Jung, M. -L., Kim, S. -H., Park, S. -W., Kyoung, J. -S., An, I. -S., Oh, S. -K. SPIE - The International Society of Optical Engineering
5 国際会議録 The detectability of Qz phase defects and its application for 65 nm node CPL mask manufacturing [5992-05] Cho, W. I., Park, J. H., Chung, D. H., Choi, S. W., Han, W. S. SPIE - The International Society of Optical Engineering	11 国際会議録 Catalytic applications of Fe-MCM-41 for phenol hydroxylation and CNTs synthesis J.S. Choi, S.S. Yoon, S.H. Jang, W.S. Ahn, H.J. Choi Elsevier
6 国際会議録 Application of the unified mask data format based on OASIS for VSB EB writers [5992-195] Suzuki, T., Hirumi, J., Suga, O. SPIE - The International Society of Optical Engineering	12 国際会議録 Shot based MRC flow by using full chip MRC tool M. -K. Ji, S. -H. Jang, S. -J. Son, J. -H. Choi, S. -G. Woo, H. -K. Cho SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12