A novel strategy of lithography-error-budget optimization for the 65-nm node: mask specifications for hyper-NA imaging [5992-35]

A novel strategy of lithography-error-budget optimization for the 65-nm node: mask specifications for hyper-NA imaging [5992-35]

著者名:

掲載資料名:

25th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5992

発行年:

2005

パート:

1

開始ページ:

59920Y

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

言語:

英語

請求記号:

P63600/5992

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016029
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2005 : 25th
会議開催地:	Monterey, California, USA
会議開催年:	2005.10.04-2005.10.07

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2 国際会議録 A novel robust optimization method of exposure and mask conditions for beyond 65 nm-node lithography [5853-115] Takeuchi, K., lwase, K., Ozawa, K., Uesawa, F. SPIE - The International Society of Optical Engineering	8 国際会議録 Lithography strategy for 65-nm node (Invited Paper) Borodovsky, Y.A., Schenker, R.E., Allen, G.A., Tejnil, E., Hwang, D.H., Lo, F.-C., Singh, V.K., Gleason, R.E., … SPIE-The International Society for Optical Engineering
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