Advanced reticle inspection challenges and solutions for 65nm node [5992-12]

Advanced reticle inspection challenges and solutions for 65nm node [5992-12]

著者名:

Kim, W. D. ( Texas Instruments Inc. (USA) )
Eickhoff, M. D.
Kim, D. ( KLA-Tencor Corp (USA) )
McCurley, S. ( Texas Instruments Inc. (USA) )

掲載資料名:

25th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5992

発行年:

2005

パート:

1

開始ページ:

59920C

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

言語:

英語

請求記号:

P63600/5992

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016029
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2005 : 25th
会議開催地:	Monterey, California, USA
会議開催年:	2005.10.04-2005.10.07

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