Implementation of reflected light die-to-die inspection and ReviewSmart to improve 65nm DRAM mask fabrication [5992-09]
- 著者名:
Kim, D. Y. Cho, W. I. Park, J. H. Chung, D. H. Cha, B. C. Choi, S. W. Han, W. S. ( Samsung Electronics Co., Ltd (South Korea) ) Park, K. H. Kim, N. W. Hess, C. Ma, W. Kim, D. ( KLA-Tencor Corp (USA) ) - 掲載資料名:
- 25th Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5992
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 599209
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819460141 [0819460141]
- 言語:
- 英語
- 請求記号:
- P63600/5992
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
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SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
国際会議録
A study of organic contamination control on photomask surface for 65-nm tech node [5992-114]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |