The detectability of Qz phase defects and its application for 65 nm node CPL mask manufacturing [5992-05]

The detectability of Qz phase defects and its application for 65 nm node CPL mask manufacturing [5992-05]

著者名:

Cho, W. I.
Park, J. H.
Chung, D. H.
Choi, S. W.
Han, W. S. ( Samsung Electronics Co., Ltd. (South Korea) )

掲載資料名:

25th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5992

発行年:

2005

パート:

1

開始ページ:

599205

終了ページ:

599205

総ページ数:

1

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819460141 [0819460141]

言語:

英語

請求記号:

P63600/5992

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016029
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2005 : 25th
会議開催地:	Monterey, California, USA
会議開催年:	2005.10.04-2005.10.07

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