Low energy inductively coupled plasma etching of HgCdTe [5964-07]

Low energy inductively coupled plasma etching of HgCdTe [5964-07]

著者名:

Hu, X.

Ye, Z.

Ding, R.

He, L. ( Shanghai Institute of Technical Physics, CAS (China) )

Tan, G. ( Oxford Instrument Plasma Technology (Singapore) )

Deng, L. ( Oxford Instrument Plasma Technology (United Kingdom)) )

さらに 1 件

掲載資料名:

Detectors and associated signal processing II : 13-14 September 2005, Jena, Germany

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5964

発行年:

2005

開始ページ:

596408

終了ページ:

596408

総ページ数:

1

出版情報:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819459824 [0819459828]

言語:

英語

請求記号:

P63600/5964

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016001
シリーズID:	PA00000029
会議名:	SPIE Optical Systems Design : Detectors and associated signal processing
回次:	2005 : 2nd
会議開催地:	Jena, Germany
会議開催年:	2005.09.13-2005.09.14

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