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Comparative study of IR and UV laser damage resistance of silica thin films deposited by electron beam deposition, ion plating, ion assisted deposition and dual ion beam sputtering [5963-35]

著者名:
Gallais, L.
Krol, H.
Capoulade, J.
Cathelinaud,M.
Roussel, L.
Albrand, G.
Natoli, J. -Y.
Commandre, M.
Lequime, M.
Amra, C. ( Institut Fresnel (France) )
さらに 5 件
掲載資料名:
Advances in optical thin films II : 13-15 September 2005, Jena, Germany
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5963
発行年:
2005
開始ページ:
59630Z
出版情報:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819459817 [081945981X]
言語:
英語
請求記号:
P63600/5963
資料種別:
国際会議録

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2 国際会議録 Threshold distribution determination of laser-induced damage precursors in optical coatings and substrates

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4 国際会議録 Multiple pulses laser irradiation study in silica

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