X-ray beam metrology and X-ray optic alignment by Hartmann wavefront sensing [5921-10]
- 著者名:
Mercere, P. ( Synchroton SOLEIL (France) ) Bucourt, S. ( Imagine Optic (France) ) Cauchon, G. ( Synchroton SOLEIL (France) ) Douillet, D. ( Lab d’Optique Appliquee ENSTA, Ecole Polytechnique (France) ) Dovillaire, G. ( Imagine Optic (France) ) Goldberg, K. A. ( Lawrence Berkeley National Lab. (USA) ) Idir, M. ( Synchroton SOLEIL (France) ) Levecq, X. ( Imagin Optic (France) ) Moreno, T. ( Synchroton SOLEIL (France) ) Naulleau, P. P. Rekawa, S. ( Lawrence Berkeley National Lab. (USA) ) Zeitoun, O. ( Lab d’Optique Appliquee ENSTA, Ecole Polytechnique (France) ) - 掲載資料名:
- Advances in metrology for x-ray and EUV optics : 2-3 August 2005, San Diego, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5921
- 発行年:
- 2005
- 開始ページ:
- 592109
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819459268 [0819459267]
- 言語:
- 英語
- 請求記号:
- P63600/5921
- 資料種別:
- 国際会議録
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10
国際会議録
Extremely fine-pitch printing with a 10×Schwarzschild optic at extreme-ultraviolet wavelengths
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SPIE - The International Society of Optical Engineering |
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SPIE - The International Society of Optical Engineering |