Scatter analysis of optical componets from 193 nm to 13.5 nm [5878-30]

Scatter analysis of optical componets from 193 nm to 13.5 nm [5878-30]

著者名:

Schroeder, S.
Kamprath, M.
Gliech, S.
Duparre, A. ( Fraunhofer-institut fuer Angewandte Optik und Feinmechanik (Germany) )

掲載資料名:

Advanced characterization techniques for optics, semiconductors, and nanotechnologies II : 2-4 August, 2005, San Diego, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5878

発行年:

2005

開始ページ:

58780T

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458834 [081945883X]

言語:

英語

請求記号:

P63600/5878

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015917
シリーズID:	PA00000029
会議名:	Optics & Photonics : Advanced characterization techniques for optics, semiconductors, and nanotechnologies
回次:	2005 : 2nd
会議開催地:	San Diego, CA, USA
会議開催年:	2005.08.02-2005.08.04

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