Chemical Vapor Deposition and Defect Characterization of Silicon Carbide Epitaxial Films
- 著者名:
Chen, Yi Dhanaraj, Govindhan Chen, Hui Vetter, Willaim Dudley, Michael Zhang, Hui - 掲載資料名:
- Progress in semiconductor materials V--novel materials and electronic and optoelectronic applications : symposium held November 28-December 1, 2005, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 891
- 発行年:
- 2006
- 開始ページ:
- 591
- 終了ページ:
- 596
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558998452 [1558998454]
- 言語:
- 英語
- 請求記号:
- M23500/891
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society | |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |
10
国際会議録
MgB2 Thick Film Grown on Silicon Carbide Substrate by Hybrid Physical-Chemical Vapor Deposition
Trans Tech Publications |
Trans Tech Publications |
Trans Tech Publications |
Trans Tech Publications |
Materials Research Society |