PIEZOELECTRIC EFFECT ON PLASMA CHEMICAL VAPOR DEPOSITION OF HYDROGENATED AMORPHOUS SILICON FILMS

PIEZOELECTRIC EFFECT ON PLASMA CHEMICAL VAPOR DEPOSITION OF HYDROGENATED AMORPHOUS SILICON FILMS

著者名:

掲載資料名:

Amorphous silicon technology, 1993 : Symposium held April 13-16, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

297

発行年:

1993

開始ページ:

139

終了ページ:

144

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991934 [155899193X]

言語:

英語

請求記号:

M23500/297

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015781
シリーズID:	PA00000011
会議名:	Symposium on amorphous silicon technology
回次:	1993
会議開催地:	San Francisco, CA, USA
会議開催年:	1993.04.13-1993.04.16

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2 国際会議録 AMORPHOUS HYDROGENATED SILICON CARBIDE PREPARED FROM DC-BIASED RF-PLASMA-ENHANCED CHEMICAL VAPOR DEPOSiTION Lu, H.Y., Petrich, M.A. Materials Research Society	8 国際会議録 Scanning Tunneling Microscopy Study of the Growth Mechanism for Hydrogenated Amorphous Silicon Produced by Plasma Enhanced Chemical Vapor Deposition Flewitt, A. J., Milne, W. I., Robertson, J., Stephenson, A. W., Welland, M. E. MRS - Materials Research Society
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