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*LOW TEMPERATURE SYNTHESIS OF SILICON OXIDE AND OXYNITRIDE FILMS BY REACTIVE LASER ABLATION

著者名:
Fogarassy, E.
Fuchs, C.
Slaoui, A.
De Unamuno, S.
Stoquert, J.-P.
Marine, W.
Lang, B.
さらに 2 件
掲載資料名:
Laser ablation in materials processing : fundamentals and applications : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
285
発行年:
1993
開始ページ:
319
終了ページ:
330
総ページ数:
12
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991804 [1558991808]
言語:
英語
請求記号:
M23500/285
資料種別:
国際会議録

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