TRANSIENT FLAT-BAND VOLTAGE SHIFTS FOLLOWING HIGH VOLTAGE STRESSING OF THIN OXIDES

TRANSIENT FLAT-BAND VOLTAGE SHIFTS FOLLOWING HIGH VOLTAGE STRESSING OF THIN OXIDES

著者名:

掲載資料名:

Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

284

発行年:

1993

開始ページ:

235

終了ページ:

240

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991798 [1558991794]

言語:

英語

請求記号:

M23500/284

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015768
シリーズID:	PA00000011
会議名:	Symposium on amorphous insulating thin films
回次:	1992
会議開催地:	Boston, MA, USA
会議開催年:	1992.12.01-1992.12.04

類似資料:

1 国際会議録 MEASUREMENT OF HIGH VOLTAGE STRESS INDUCED TRAPS INSIDE THIN SILICON OXIDE FILMS Dumin, D.J., Maddux, J.R. Materials Research Society	7 国際会議録 The Transient Nature Of Excess Low-Level Leakage Currents In Thin Oxides Scott, R.S., Dumin, D.J. Electrochemical Society
2 国際会議録 Evidence For Non-Uniform Trap Distributions In Thin Oxides After High Voltage Stressing Dumin, D.J., Vanchinathan, S., Mopuri, S., Subramoniam, R. Electrochemical Society	8 国際会議録 COMPARISON OF THE DENSITY AND DISTRIBUTION OF TRAPS GENERATED BY HIGH VOLTAGE STRESS IN SILICON OXIDE AND SILICON OXYNITRIDES Richardson, J.T., Dumin, D.J., Lo, G.Q., Kwong, D.L., Gross, B.J., Sodini, C.G. Materials Research Society
3 国際会議録 Voltage And Fluence Dependence Of Stress Generated Traps Inside Thin Silicon Oxide Scott, R.S., Dumin, D.J. Electrochemical Society	9 国際会議録 Thickness Dependence of Oxide Wearout Dumin, D.J. Electrochemical Society
4 国際会議録 STRESS INDUCED INCREASED LOW LEVEL LEAKAGE IN THIN OXIDES Dumin, D.J., Maddux, J.R., Wong, D.-P. Materials Research Society	10 国際会議録 Traps In Reoxidized Nitrided Oxides Of Varying Thicknesses Natarajan, B., Dumin, D.J. Electrochemical Society
5 国際会議録 The Search for Cathode and Anode Traps in High-Voltage Stressed Sillicon Oxides Chen, L., Kang, C.S., Oralkan, O., Dumin, D.J., Brown, G.A., Bellutti, P. Electrochemical Society	11 国際会議録 A Comprehensive Physical Model of Oxide Wearout and Breakdown Explaining the Fluence, Time, Field, and Dependence of Trap Generation Thickness Quian, D., Dumin, D.J. Electrochemical Society
6 国際会議録 Wearout And Breakdown In Thin Silicon Oxide Dumin, D.J. Electrochemical Society	12 国際会議録 VOLTAGE, FLUENCE, AND POLARITY DEPENDENCE OF TRAP GENERATION INSIDE OF THIN SILICON OXIDE FILMS Scott, Ronald S., Dumin, David J. Materials Research Society

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