*DIGITAL CHEMICAL VAPOR DEPOSITION OF SILICON OXIDE-NITRIDE AND ITS SURFACE REACTION STUDY
- 著者名:
Sakaue, H. Nakasako, T. Nakaune, K. Kusuki, T. Miki, A. Horiike, Y. - 掲載資料名:
- Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 284
- 発行年:
- 1993
- 開始ページ:
- 169
- 終了ページ:
- 180
- 総ページ数:
- 12
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991798 [1558991794]
- 言語:
- 英語
- 請求記号:
- M23500/284
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
MRS - Materials Research Society |
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American Institute of Chemical Engineers |
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11
国際会議録
Precursors for the Chemical Vapor Deposition of Titanium Nitride and Titanium Aluminum Nitride Films
MRS - Materials Research Society |
MRS - Materials Research Society |