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DEPOSITION OF FLUORINE DOPED TUNGSTEN OXIDE THIN FILMS BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION

著者名:
掲載資料名:
Microcrystalline semiconductors : materials science & devices : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
283
発行年:
1993
開始ページ:
933
終了ページ:
938
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991781 [1558991786]
言語:
英語
請求記号:
M23500/283
資料種別:
国際会議録

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