ELECTRICAL AND OPTICAL PROPERTIES OF INDIUM DOPED ZINC OXIDE FILMS PREPARED BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION

ELECTRICAL AND OPTICAL PROPERTIES OF INDIUM DOPED ZINC OXIDE FILMS PREPARED BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION

著者名:

掲載資料名:

Microcrystalline semiconductors : materials science & devices : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

283

発行年:

1993

開始ページ:

891

終了ページ:

896

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991781 [1558991786]

言語:

英語

請求記号:

M23500/283

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015767
シリーズID:	PA00000011
会議名:	Symposium on microcrystalline semiconductors
回次:	1992
会議開催地:	Boston, MA, USA
会議開催年:	1992.11.30-1992.12.04

類似資料:

1 国際会議録 DEPOSITION OF HIGHLY TRANSPARENT AND CONDUCTIVE FLUORINE DOPED ZINC OXIDE FILMS Hu, Jianhua, Gordon, Roy G. Materials Research Society	7 国際会議録 Review on Indium Zinc Oxide Films: Material Properties and Preparation Techniques G.J. Shyju, S. Dawn Dharma Roy, C. Sanjeeviraja Trans Tech Publications
2 国際会議録 CHEMICAL VAPOR DEPOSITION OF HIGHLY TRANSPARENT AND CONDUCTIVE BORON DOPED ZINC OXIDE THIN FILMS Hu, Jinhua, Gordon, Roy G. Materials Research Society	8 国際会議録 DEPOSITION OF FLUORINE DOPED TUNGSTEN OXIDE THIN FILMS BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION Proscia, James W., Winter, Charles H., Reck, Gene P., Wen, Gang Gang Materials Research Society
3 国際会議録 ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION OF GALLIUM NITRIDE THIN FILMS Gordon, Roy G., Hoffman, David M., Riaz, Umar Materials Research Society	9 国際会議録 Electrical and Optical Properties of Zinc Oxide Thin Films and Heavily Aluminum-Doped Zinc Oxide Thin Films Prepared by Molecular Beam Epitaxy Ohgaki, Takeshi, Kawamura, Yuji, Ohashi, Naoki, Kakemoto, Hirofumi, Wada, Satoshi, Adachi, Yutaka, Haneda, Hajime, … Materials Research Society
4 国際会議録 Chemical Vapor Deposition and Properties of Amorphous Aluminum Oxide Films Gordon, Roy G., Kramer, Keith, Liu, Xinye MRS - Materials Research Society	10 国際会議録 PREPARATION OF ZINC OXIDE FILMS BY LOW-PRESSURE CHEMICAL VAPOR DEPOSITION METHOD Nishino, Junichi, Ohshio, Shigeo, Kamata, Kiichiro MRS - Materials Research Society
5 国際会議録 Atmospheric Pressure Chemical Vapor Deposition of Titanium Nitride From Titanium Bromide and Ammonia Gordon, Roy G., Frisbie, Ross W., Musher, Joshua, Thornton, John MRS - Materials Research Society	11 国際会議録 Characterization of Vanadium Oxide Films Prepared by Atmospheric Pressure Chemical Vapour Deposition Vernardou, D., Pemble, M.E., Sheel, D., M Ivan, T.D., Parkin, P. Electrochemical Society
6 国際会議録 Electrical and optical properties of thin films prepared by spin coating a dispersion of nano- sized tin-doped indium-oxide particles Ederth, J., Hultaker, A., Heszler, P., Niklasson, G.A., Granqvist, C.G., van Doorn, A.K., van Haag, C., Jongerius, M.J., … SPIE-The International Society for Optical Engineering	12 国際会議録 Electrical Properties of SiO2-Films Prepared by VUV Chemical Vapor Deposition Motoyama, Y., Miyano, J., Tosikawa, K., Yagi, Y., Kurosawa, K., Yokotani, A., Sasaki, W. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12