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MECHANISM OF REACTIVE ION ETCHING OF POLYMERIC FILMS IN OXYGEN-BASED PLASMAS

著者名:
掲載資料名:
Chemical perspectives of microelectric materials III : symposium held November 30-December 3, 1992, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
282
発行年:
1993
開始ページ:
617
終了ページ:
622
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991774 [1558991778]
言語:
英語
請求記号:
M23500/282
資料種別:
国際会議録

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