REACTOR ISSUES IMPORTANT FOR THE DEPOSITION OF SELECTIVE TUNGSTEN BY CHEMICAL VAPOR DEPOSITION USING THE SiH4 REDUCTION OF WF6

REACTOR ISSUES IMPORTANT FOR THE DEPOSITION OF SELECTIVE TUNGSTEN BY CHEMICAL VAPOR DEPOSITION USING THE SiH4 REDUCTION OF WF6

著者名:

掲載資料名:

Chemical perspectives of microelectric materials III : symposium held November 30-December 3, 1992, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

282

発行年:

1993

開始ページ:

371

終了ページ:

378

総ページ数:

8

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991774 [1558991778]

言語:

英語

請求記号:

M23500/282

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015766
シリーズID:	PA00000011
会議名:	Symposium on chemical perspectives of microelectric materials
回次:	3rd
会議開催地:	Boston, MA, USA
会議開催年:	1992.11.30-1992.12.03

類似資料:

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2 国際会議録 Origin of Selectivity in Chemical Vapor Deposition of Tungsten Using SiH4 or SiH2F2 as a Reducing Gas of WF6 Kobayashi, N., Nakamura, Y., Goto, H., Homma, Y. Electrochemical Society	8 国際会議録 PROPERTIES OF IN SITU DOPED AMORPHOUS AND POLYCRYSTALLINE SILICON DEPOSITED BY CHEMICAL VAPOR DEPOSITION FROM TERTIARYBUTYLARSINE AND TERTIARYBUTYLPHOSPHINE Kotecki, David E., Blouse, Jeffrey L., Parks, Christopher C., Sarkozy, Robert F. Materials Research Society
3 国際会議録 SELECTIVE CHEMICAL VAPOUR DEPOSITION OF TUNGSTEN USING SiH4WF6 CHEMISTRY van der Jeugd, C.A., Verbruggen, A.H., Leusink, G.J., Janssen, G.C.A.M., Radelaar, S. Materials Research Society	9 国際会議録 Low Temperature Selective Si Epitaxy By Reduced Pressure Chemical Vapor Deposition Introducing Periodic Deposition And Etching Cycles With SiH4, H2 And HC1 Kang, J. Y., Kim, H. S., Lee, J. Y., Shim, K. H. Materials Research Society
4 国際会議録 Modeling of Selectivity Loss During Chemical Vapor Deposition of Tungsten by Hydrogen Reduction of Tungsten Hexafluoride Chang, C.-W., Desatnik, N., Thompson, B. Electrochemical Society	10 国際会議録 The Effect Of Aging On Tungsten Filament Surface Kinetics In Hot-Wire Chemical Vapor Deposition Of Silicon Holt, Jason K., Swiatek, Maribeth, Goodwin, David G., Atwater, Harry A. Materials Research Society
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6 国際会議録 Chemical Vapor Deposition with SiH4 and Acetylene in Microcapillary Nishikawa, T., Yano, M. Electrochemical Society	12 国際会議録 SELECTIVE CHEMICAL VAPOR DEPOSITION Holleman, J. Kluwer Academic Publishers

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