EVIDENCE FOR VACANCY CLUSTERING IN SILICON IMPLANTED INDIUM PHOSPHIDE

EVIDENCE FOR VACANCY CLUSTERING IN SILICON IMPLANTED INDIUM PHOSPHIDE

著者名:

掲載資料名:

Materials modification by energetic atoms and ions : symposium held April 28-30, 1992, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

268

発行年:

1992

開始ページ:

319

終了ページ:

324

総ページ数:

6

出版情報:

Pittsburgh, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781558991637 [1558991638]

言語:

英語

請求記号:

M23500/268

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015752
シリーズID:	PA00000011
会議名:	Symposium on materials modification by energetic atoms and ions
回次:	1992
会議開催地:	San Francisco, CA, USA
会議開催年:	1992.04.28-1992.04.30

類似資料:

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2 国際会議録 Co-Implantation and the Role of Implant Damage in the Thermal Stability of Implanted Helium in Indium Phosphide Simpson, Todd W., Mitchell, Ian V. Materials Research Society	8 国際会議録 Positron Annihilation at Ionized Acceptors and Vacancies in Indium Phosphide After Electron Irradiation Tomqvist,M., Nissila,J., Kiesling,F., Corbel,C., Saarinen,K., Seitsonen,A.P., Hautojarvi,P. Trans Tech Publications
3 国際会議録 Ion Implantation Damage in Silicon Studied Using Slow Positrons,RBS and Infrared Absorption Simpson,P.J., Vos,M., Mitchell,I.V., Wu,C., Schultz,P.J. Trans Tech Publications	9 国際会議録 Strength of indium-phosphide-based microstructures Greek,S., Hjort,K., Schweitz,J.-A., Seassal,C., Leclercq,J.-L., Gendry,M., Besland,M.-P., Viktorovitch,P., Figuet,C., … SPIE-The International Society for Optical Engineering
4 国際会議録 STUDIES OF DISLOCATION FORMATION IN ANNEALED SELF-ION IRRADIATED SILICON Goldberg, R. D., Simpson, T. W., Mitchell, I. V., Schultz, P. J. MRS - Materials Research Society	10 国際会議録 TEMPERATURE DEPENDENT AMORPHIZATION OF SILICON DURING SELF IMPLANTATION Maszara, W.P., Rozgonyi, G.A., Simpson, L., Wortman, J.J. Materials Research Society
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