DEVICE DEGRATION ON A FULL-FRAME CCD IMAGE SENSORWITH A TRANSPARENT GATE ELECTRODE

DEVICE DEGRATION ON A FULL-FRAME CCD IMAGE SENSORWITH A TRANSPARENT GATE ELECTRODE

著者名:

Hseih, Biay-Cheng

掲載資料名:

Defect engineering in semiconductor growth, processing and device technology : symposium held April 26-May 1, 1992, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

262

発行年:

1992

開始ページ:

803

終了ページ:

808

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991576 [1558991573]

言語:

英語

請求記号:

M23500/262

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015746
シリーズID:	PA00000011
会議名:	Symposium on defect engineering in semiconductor growth, processing and device technology
回次:	1992
会議開催地:	San Francisco, CA, USA
会議開催年:	1992.04.26-1992.05.01

類似資料:

1 国際会議録 Six-million-pixel full-frame true 2-ｦｵ CCD image sensor incorporating transparent gate technology and optional antiblooming protection Meisenzahl,E.J., Chang,W.C., Deslardin,W., Kosman,S.L., Shepherd,J.E., Stevens,E.G., Wong,K.Y. SPIE - The International Society for Optical Engineering	7 国際会議録 Integration of Hfx Tay N Metal Gate Electrode with High-k Gate Dielectric in MOS Devices K. Chang-Liao, C. Cheng, T. Wang, Y. Wang Electrochemical Society
2 国際会議録 True two-phase CCD image sensors employing a transparent gate Jardin,W.Des, Kosman,S.L. SPIE - The International Society for Optical Engineering	8 国際会議録 Ultrahigh-frame CCD imagers Lowrance, J.L., Mastrocola, V.J., Renda, G.F., Swain, P.K., Kabra, R., Bhaskaran, M., Tower, J.R., Levine, P.A. SPIE - The International Society of Optical Engineering
3 国際会議録 3.2-million-pixel full-frame true 2ｦﾕ CCD image sensor incorporating transparent gate technology Meisenzahl,E.J., Chang,W.C., Desiardin,W., Doan,H.Q., Shepherd,J.P., Stevens,E.G. SPIE - The International Society for Optical Engineering	9 国際会議録 PN-CCD camera for XMM: performance of full frame and window operating modes Pfeffermann,E., Brauninger,H.W., Briel,U. G., Dennerl,K., Haberl,F., Hartner,G. D., Meidinger,N., Reppin,C., Struder,L., … SPIE-The International Society for Optical Engineering
4 国際会議録 Two-phase full-frame CCD with double ITO gate structure for increased sensitivity Des Jardin, W., Kosman, S., Kurfiss, N., Johnson, J., Losee, D., Putnam, G.G., Tanbakuchi, A. SPIE - The International Society of Optical Engineering	10 国際会議録 Device Fabrication and Evaluation of Alternative High-K Dielectrics and Gate Electrodes Using a Non-Self Aligned Gate process Kim, I., Han, S.K., Kiether, W., Lee, S.J., Lee, C.H., Luan, H.F., Luo, Z., Rying, E., Wicaksana, Z.Wang D., Zhu, W., … Electrochemical Society
5 国際会議録 Advanced process and device modeling of full-frame CCD imagers (Invited Paper) Wordelman, C.J., Banghart, E.K. SPIE - The International Society of Optical Engineering	11 国際会議録 An LOD with improved breakdown voltage in full-frame CCD devices Banghart, E. K., Stevens, E. G., Doan, H. Q., Shepherd, J. P., Meisenzahl, E. J. SPIE - The International Society of Optical Engineering
6 国際会議録 Gated MCP framing camera system Shan,B., Chang,Z., Liu,J., Liu,X., Gao,S., Ren,Y., Zhu,W., Luo,Y., Cheng,J., Yang,C., Wen,T., Tang,D., Wen,S., Zheng,Z. SPIE-The International Society for Optical Engineering	12 国際会議録 Time-gated holographic imaging using photorefractive multiple quantum well devices Jones,R., Barry,N.P., Hyde,S.C.W., Dainty,J.C., French,P.M.W., Kwolek,K.M., Nolte,D.D., Melloch,M.R. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12