PLASMA-SURFACE INTERACTION LIMITS FOR REMOTE H-PLASMA CLEANING OF Si(100)

PLASMA-SURFACE INTERACTION LIMITS FOR REMOTE H-PLASMA CLEANING OF Si(100)

著者名:

掲載資料名:

Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

259

発行年:

1992

開始ページ:

213

終了ページ:

218

総ページ数:

6

出版情報:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558991545 [1558991549]

言語:

英語

請求記号:

M23500/259

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015743
シリーズID:	PA00000011
会議名:	Symposium on chemical surface preparation, passivation, and cleaning for semiconductor growth and processing
回次:	1992
会議開催地:	San Francisco, CA, USA
会議開催年:	1992.04.27-1992.04.29

類似資料:

1 国際会議録 REDUCTION OF SURFACE ROUGHENING AND SUBSURFACE DEFECTS IN H-PLASMA CLEANING OF Si (100) Schneider, T.P., Montgomery, J.S., Ying, H., Barnak, J.P., Chen, Y.L., Maher, D.M., Nemanich, R.J. Electrochemical Society	7 国際会議録 A STUDY OF SURFACE AND SUBSURFACE PROPERTIES OF Si(100) AFTER HYDROGEN ION-BEAM EXPOSURE Liu, H. X., Schneider, T. P., Montgomery, J., Chen, Y. L., Buczkowski, A., Shimura, F., Nemanich, R. J., Maher, D. M., … MRS - Materials Research Society
2 国際会議録 PLASMA SURFACE INTERACTIONS AND SURFACE PRORERTIES FOR REMOTE H-PLASMA CLEANING OF Si(100) Schneider, T. P., Cho, J., Chen, Y. L., Maher, D. M., Nemanich, R. J. MRS - Materials Research Society	8 国際会議録 Removal of SiO2 from Si(100) by Remote H2/SiH4 Plasma Prior to Epitaxial Growth Barnak, J. P., Ying, H., Chen, Y. L., Montgomery, J., Nemanich, R. J. MRS - Materials Research Society
3 国際会議録 SURFACE ELECTRONIC STATES OF LOW TEMPERATURE H-PLASMA CLEANED Si(100) AND Ge(100) SURFACES Cho, Jaewon, Schneider, T.P., Nemanich, R.J. Materials Research Society	9 国際会議録 Removal of Fluorine from a Si(100) Surface by a Remote rf hydrogen Plasma Barnak, J. P., King, S., Montgomery, J., Ku, Ja-Hum, Nemanich, R. J. MRS - Materials Research Society
4 国際会議録 PROCESS AND SURFACE CHARACTERIZATION OF HYDROGEN PLASMA CLEANING OF Si(100) Schneider, T.P., Cho, J., Vander Weide, J., Wells, S.E., Lucovsky, G, Nemanich, R.J., Mantini, M.J., Rudder, R.A., … Materials Research Society	10 国際会議録 RIE Passivation Layer Removal by Remote H-Plasma and H2/SiH4 Plasma Processing Ying, Hong, Barnak, J. P., Chen, Y. L., Nemanich, R. J. MRS - Materials Research Society
5 国際会議録 LOW TEMPERATURE HYDROGEN PLASMA CLEANING PROCESSES OF Si(100), Ge(100), AND SixGe1-x(100) Schneider, T.P., Aldrich, D.A., Cho, J., Nemanich, R.J. Materials Research Society	11 国際会議録 SURFACE AND INTERFACE MORPHOLOGY OF SMALL ISLANDS OF TiSi2 AND ZrSi2 ON (001) SILICON Kropman, B.L., Sukow, C.A., Nemanich, R.J. Materials Research Society
6 国際会議録 Si(100) SURFACE PREPARATION BY IN-SITU OR IN-VACUO EXPOSURE TO REMOTELY PLASMA-GENERATED ATOMIC HYDROGEN: APPLICATIONS TO DEPOSITED SiO2 AND EPITAXIAL GROWTH OF … Yasuda, T., Ma, Y., Habermehl, S., Kim, S.S., Lucovsky, G., Schneider, T.P., Cho, J., Nemanich R.J. Materials Research Society	12 国際会議録 Chemical, Electrical, and Structural Properties of Au/Pd Contacts on Chemical Vapor Cleaned p-type GaN Surfaces Hartlieb, P.J., Roskowski, A., Rodriguez, B.J., Nemanich, R.J., Davis, R.F. Materials Research Society

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