SURFACE CLEANING PRIOR TO FORMATION OF Si/SiO2 INTERFACES BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (RPECVD)
- 著者名:
Lamb, H.H. Kalem, S. Bedge, S. Yasuda, T. Ma, Y. Lucovsky, G. - 掲載資料名:
- Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 259
- 発行年:
- 1992
- 開始ページ:
- 75
- 終了ページ:
- 80
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991545 [1558991549]
- 言語:
- 英語
- 請求記号:
- M23500/259
- 資料種別:
- 国際会議録
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Si-N BONDING AT THE SiO2/Si INTERFACES DURING DEPOSITION OF SiO2 BY THE REMOTE PECVD PROCESS
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