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SURFACE CLEANING PRIOR TO FORMATION OF Si/SiO2 INTERFACES BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (RPECVD)

著者名:
Lamb, H.H.
Kalem, S.
Bedge, S.
Yasuda, T.
Ma, Y.
Lucovsky, G.
さらに 1 件
掲載資料名:
Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
259
発行年:
1992
開始ページ:
75
終了ページ:
80
総ページ数:
6
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558991545 [1558991549]
言語:
英語
請求記号:
M23500/259
資料種別:
国際会議録

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